Lithography Development
Monday, 09 April, 2001
The Extreme Ultra Violet (EUV) LLC and IBM have announced that IBM has joined the industry consortium to support the development of EUV lithography technology.
This is being developed to allow semiconductor manufacturers to etch circuit lines smaller than 0.1 micron, creating future generations of more powerful microprocessors and higher density memory chips.
Processors built using EUV technology are expected to reach speeds of up to 10 GHz in 2005 - 2006.
The EUV LLC is working directly with Silicon Valley Group Lithography (SVGL) and ASM Lithography to commercialise EUV technology, targeting availability of manufacturing tools in 2005.
The EUV LLC has also developed relationships with more than 40 US-based infrastructure companies to ensure that all the key components can be attained for commercialisation.
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