Lithography collaboration
NIL Technology and IMS Chips have started a collaboration to combine their capabilities related to electron beam lithography.
NIL is experienced with the production of stamps through the operation of a Gaussian-shaped electron beam writer; IMS Chips has developed various patterning technologies for wafers, masks and stamps using a variable shape electron beam writer.
The direct access to both Gaussian-shaped and variable-shaped electron beam lithography puts the two organisations in a position to combine high-speed and high-resolution definition of nanostructures.
Complex stamps for NIL can be produced at high quality.
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