Faster FeRAM on the way

Wednesday, 03 September, 2003

Epson is developing a ferroelectric material for ferroelectric random-access memory (FeRAM), a next generation type of memory. The new material has been tentatively named PZTN.

To create the material, Epson has added niobium in place of some of the titanium in lead zirconate titanate (PZT), a candidate for use in FeRAM material. Using an original technique, the company has been able to introduce niobium in 20 to 30 times the quantity that was previously practically possible.

As a result, Epson has been able to overcome the oxygen deficit that had caused problems with FeRAM.

The company is now proceeding with technical testing of the FeRAM-based electronic devices using the PZTN material. Potential applications may include IC cards, mobile phones and as a semiconductor memory substitute.

Related News

Gallium-doped transistors boost computing power

Researchers have deposited gallium-doped indium oxide one atomic layer at a time to build a tiny...

New model to boost performance of OLEDs

Researchers have developed a new analytical model detailing the kinetics of the exciton dynamics...

Advantech introduces systems pre-configured with Ignition Edge

Advantech Australia has announced an alliance with Inductive Automation to introduce a series of...


  • All content Copyright © 2025 Westwick-Farrow Pty Ltd